Showing 3 results for Karimzadeh
E. Karimzadeh Esfahani, M. Bagheri Harouni, R. Roknizadeh,
Volume 3, Issue 1 (International Journal of Optics and Photonics (IJOP) Vol. 3, No. 1, Winter-Spring 2009)
Abstract
In this paper we consider electromagnetic field quantization in the presence of a dispersive and absorbing semiconductor quantum dot. By using macroscopic approach and Green's function method, quantization of electromagnetic field is investigated. Interaction of a two-level atom , which is doped in a semiconductor quantum dot, with the quantized field is considered and its spontaneous emission rate is calculated. Comparing with the same condition for an excited atom inside the bulk, it is shown that the spontaneous emission rate of an atom will decrease.
Ayatollah Karimzadeh,
Volume 11, Issue 2 (International Journal of Optics and Photonics (IJOP) Vol 11, No 2, Summer-Fall 2017)
Abstract
Infrared imagers are important for reorganization and monitoring. This paper discusses the design of an infrared imager. Optical design in medium wavelength infrared (MWIR) and long wavelength infrared (LWIR) bands is different and needs distinct detectors and materials. Reflective systems are not suitable due to their small field of view (FOV) and vignetting. Refractive dual band optical system has been designed with considering both regions assessment and each band detector specifications.
Sajjad Aghajari, Mohammadmehdi Jahanbakhshian, Rouhollah Karimzadeh,
Volume 17, Issue 1 (Winter-Spring 2023)
Abstract
One of the basic requirements in the fabrication of microfluidic (MF) and optofluidic (OF) chips is a suitable initial mold, which is generally prepared with the help of a photoresist material. In this research, we investigate the SPE-60 photoresist as a quality alternative to the conventional SU-8 photoresist to achieve molds with thicknesses ranging from 25μm to 130μm and address the challenges of mold-making with this photoresist. The conventional photolithography method is used to assess the material's ability in mold making. The results show that SPE-60 molds have vertical edges, clean facets, and edges, complete voids between different components, and demonstrate good pattern transfer from the photomask to the SPE-60 film at various thicknesses. This article also suggests some ways to improve accuracy and reduce edge scattering. As a result, based on the experimental results, SPE-60 can be considered a cost-effective and suitable alternative to SU-8 photoresist in the fabrication of MF and OF molds.
